Browsing by Subject "Sputter deposition"

Now showing items 1-3 of 3

    • Article  

      Active process control of reactive sputter deposition 

      Voevodin, A. A.; Stevenson, P.; Rebholz, Claus; Schneider, J. M.; Matthews, A. (1995)
      Control of the density, composition, ionisation rate and arrival energy of species is one of the main objectives of research in the development of reactive magnetron sputtering. The deposition of the latest generation of ...
    • Article  

      Structure, mechanical and tribological properties of sputtered TiAlBN thin films 

      Rebholz, Claus; Schneider, J. M.; Voevodin, A. A.; Steinebrunner, J.; Charitidis, C.; Logothetidis, S.; Leyland, A.; Matthews, A. (1999)
      TiAlBN films were produced by simultaneously sputtering from TiAl and TiB2 targets in Ar/N2 mixtures at a substrate temperature of 150 °C. The goal of this investigation was to study the influence of the nitrogen content ...
    • Article  

      Studies of the tribological and mechanical properties of laminated CrC-SiC coatings produced by r.f. and d.c. sputtering 

      Ziegele, H.; Rebholz, Claus; Voevodin, A. A.; Leyland, A.; Rohde, S. L.; Matthews, A. (1997)
      Multilayer CrC-SiC coatings were produced by both direct current and radio frequency sputtering of Cr and Si targets in an Ar-C2H2 atmosphere. Coatings of constant thickness of about 4 μm, but with the number of layers ...