Ellipsometry on optically thin palladium films on silicon-based substrate: Effects of low concentration of hydrogen
Date
2005Source
Optical EngineeringVolume
44Issue
2Pages
1-4Google Scholar check
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Optically thin palladium films evaporated on silicon substrates are investigated following exposure to low concentrations of hydrogen gas in nitrogen using spectroscopic ellipsometry. Changes in the parameters tan Ψ and Δ are observed for concentrations as low as 0.01% hydrogen in nitrogen. A nonlinear behavior of the change in the ellipsometry parameters as a function of hydrogen concentration is demonstrated, with saturation occurring at a flow of 0.05% hydrogen in nitrogen. © 2005 Society of Photo-Optical Instrumentation Engineers.