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dc.contributor.authorLioudakis, Emmanouil E.en
dc.contributor.authorOthonos, Andreas S.en
dc.contributor.authorLioutas, Ch B.en
dc.contributor.authorVouroutzis, N.en
dc.creatorLioudakis, Emmanouil E.en
dc.creatorOthonos, Andreas S.en
dc.creatorLioutas, Ch B.en
dc.creatorVouroutzis, N.en
dc.date.accessioned2019-12-02T15:31:48Z
dc.date.available2019-12-02T15:31:48Z
dc.date.issued2008
dc.identifier.issn1931-7573
dc.identifier.urihttp://gnosis.library.ucy.ac.cy/handle/7/58846
dc.description.abstractWe have studied ultrafast carrier dynamics in nanocrystalline silicon films with thickness of a few nanometers where boundary-related states and quantum confinement play an important role. Transient non-degenerated photoinduced absorption measurements have been employed to investigate the effects of grain boundaries and quantum confinement on the relaxation dynamics of photogenerated carriers. An observed long initial rise of the photoinduced absorption for the thicker films agrees well with the existence of boundary-related states acting as fast traps. With decreasing the thickness of material, the relaxation dynamics become faster since the density of boundary-related states increases. Furthermore, probing with longer wavelengths we are able to time-resolve optical paths with faster relaxations. This fact is strongly correlated with probing in different points of the first Brillouin zone of the band structure of these materials.en
dc.sourceNanoscale Research Lettersen
dc.source.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-38149142251&doi=10.1007%2fs11671-007-9105-1&partnerID=40&md5=7808f2372046975335d1f8d14ab52e03
dc.subjectAbsorptionen
dc.subjectUltrathin filmsen
dc.subjectGrain boundariesen
dc.subjectFilm thicknessen
dc.subjectRelaxation processesen
dc.subjectNanocrystalline siliconen
dc.subjectUltrafast spectroscopyen
dc.subjectQuantum confinementen
dc.subjectBrillouin zoneen
dc.subjectNanoscale silicon thin filmsen
dc.subjectOptical pathsen
dc.titleTransient photoinduced absorption in ultrathin as-grown nanocrystalline silicon filmsen
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.1007/s11671-007-9105-1
dc.description.volume3
dc.description.issue1
dc.description.startingpage1
dc.description.endingpage5
dc.author.facultyΣχολή Θετικών και Εφαρμοσμένων Επιστημών / Faculty of Pure and Applied Sciences
dc.author.departmentΤμήμα Φυσικής / Department of Physics
dc.type.uhtypeArticleen
dc.description.notes<p>Cited By :1</p>en
dc.source.abbreviationNanoscale Res.Lett.en
dc.contributor.orcidOthonos, Andreas S. [0000-0003-0016-9116]
dc.gnosis.orcid0000-0003-0016-9116


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