Photothermal radiometric and spectroscopic measurements on silicon nitride thin films
Date
1997Author
Nestoros, MariosGutierrez-Llorente, A.
Othonos, Andreas S.
Christofides, Constantinos
Martinez-Duart, JM
ISSN
0021-8979Source
Journal of Applied PhysicsVolume
82Issue
12Pages
6215-6219Google Scholar check
Metadata
Show full item recordAbstract
Thin films of silicon nitride of various thicknesses, deposited by radio frequency magnetron sputtering on silicon quartz substrate, have been characterized by laser-induced and frequency scanned photothermal radiometry. Fourier transform infrared spectroscopy was also used to provide a qualitative description of the behavior of the films in the infrared range which shows favourable properties of these coatings to be used in passive cooling applications. (C) 1997 American Institute of Physics.