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dc.contributor.authorDenic, S. Z.en
dc.contributor.authorVasic, B.en
dc.contributor.authorCharalambous, Charalambos D.en
dc.contributor.authorChen, J.en
dc.contributor.authorWang, J. M.en
dc.creatorDenic, S. Z.en
dc.creatorVasic, B.en
dc.creatorCharalambous, Charalambos D.en
dc.creatorChen, J.en
dc.creatorWang, J. M.en
dc.date.accessioned2019-04-08T07:45:36Z
dc.date.available2019-04-08T07:45:36Z
dc.date.issued2011
dc.identifier.urihttp://gnosis.library.ucy.ac.cy/handle/7/43284
dc.description.abstractAs the CMOS semiconductor technology enters nanometer regime, interconnect processes must be compatible with device roadmaps and meet manufacturing targets at the specified wafer size. The resulting ubiquitous process variations cause errors in data delivering through interconnects. This paper proposes an Information Theory based design method to accommodate process variations. Different from the traditional delay based design metric, the current approach uses achievable rate to relate interconnect designs directly to communication applications. More specifically, the data communication over a typical interconnect, a bus, subject to process variations (uncertain bus), is defined as a communication problem under uncertainty. A data rate, called the achievable rate, is computed for such a bus, which represents the lower bound on the maximal data rate attainable over the bus. When a data rate applied over the bus is smaller than the achievable data rate, a reliable communication can be guaranteed regardless of process variations, i.e., a bit error rate arbitrarily close to zero is achievable. A single communication strategy to combat the process variations is proposed whose code rate is equal to the computed achievable rate. The simulations show that the variations in the interconnect resistivity could have the most harmful effect regarding the achievable rate reduction. Also, the simulations illustrate the importance of taking into account bus parasitic parameters correlations when measuring the influence of the process variations on the achievable rates. © 2006 IEEE.en
dc.sourceIEEE Transactions on Very Large Scale Integration (VLSI) Systemsen
dc.source.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-79952037892&doi=10.1109%2fTVLSI.2009.2033933&partnerID=40&md5=ee0dd228dd73a49f43a2acd893d1be4f
dc.subjectCommunicationen
dc.subjectDesignen
dc.subjectAchievable rateen
dc.subjectQuantum theoryen
dc.subjectLower boundsen
dc.subjectBit error rateen
dc.subjectBit error rate process variationsen
dc.subjectBit-errorsen
dc.subjectCode ratesen
dc.subjectCommunication applicationen
dc.subjectCommunication problemsen
dc.subjectCommunication strategyen
dc.subjectData ratesen
dc.subjectData-communicationen
dc.subjectDesign methoden
dc.subjectGlobal interconnecten
dc.subjectGlobal interconnectsen
dc.subjectHarmful effectsen
dc.subjectInformation theoryen
dc.subjectInterconnect designen
dc.subjectInterconnection networksen
dc.subjectModeling and analysisen
dc.subjectNano-meter regimesen
dc.subjectParasitic parameteren
dc.subjectProcess variationen
dc.subjectQuantum chemistryen
dc.subjectReliable communicationen
dc.subjectRoad-mapsen
dc.subjectSemiconductor device manufactureen
dc.subjectSemiconductor technologyen
dc.subjectWafer sizesen
dc.titleInformation theoretic modeling and analysis for global interconnects with process variationsen
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.1109/TVLSI.2009.2033933
dc.description.volume19
dc.description.issue3
dc.description.startingpage397
dc.description.endingpage410
dc.author.facultyΠολυτεχνική Σχολή / Faculty of Engineering
dc.author.departmentΤμήμα Ηλεκτρολόγων Μηχανικών και Μηχανικών Υπολογιστών / Department of Electrical and Computer Engineering
dc.type.uhtypeArticleen
dc.source.abbreviationIEEE Trans Very Large Scale Integr VLSI Systen
dc.contributor.orcidCharalambous, Charalambos D. [0000-0002-2168-0231]
dc.gnosis.orcid0000-0002-2168-0231


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