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PLD of Fe3O4 thin films: Influence of background gas on surface morphology and magnetic properties
(2006)
Ablation of Fe3O4 targets has been performed using a pulsed UV laser (KrF, λ = 248 nm, 30 ns pulse duration) onto Si(100) substrates, in reactive atmospheres of O2 and/or Ar, with different oxygen partial pressures. The ...