PLD of Fe3O4 thin films: Influence of background gas on surface morphology and magnetic properties
Ημερομηνία
2006Συγγραφέας
Paramês, M. L.Mariano, J.
Viskadourakis, Z.
Popovici, N.
Rogalski, M. S.
Giapintzakis, John
Conde, O.
Source
Applied Surface ScienceVolume
252Pages
4610-4614Google Scholar check
Keyword(s):
Metadata
Εμφάνιση πλήρους εγγραφήςΕπιτομή
Ablation of Fe3O4 targets has been performed using a pulsed UV laser (KrF, λ = 248 nm, 30 ns pulse duration) onto Si(100) substrates, in reactive atmospheres of O2 and/or Ar, with different oxygen partial pressures. The as-deposited films were characterised by atomic force microscopy (AFM), X-ray diffraction (XRD), conversion electron Mössbauer spectroscopy (CEMS) and extraction magnetometry, in order to optimise the deposition conditions in the low temperature range. The results show that a background mixture of oxygen and argon improves the Fe:O ratio in the films as long as the oxygen partial pressure is maintained in the 10-2 Pa range. Thin films of almost stoichiometric single phase polycrystalline magnetite, Fe2.99O4, have been obtained at 483 K and working pressure of 7.8 × 10-2 Pa, with a high-field magnetization of ∼490 emu/cm3 and Verwey transition temperature of 112 K, close to the values reported in the literature for bulk magnetite. © 2005 Elsevier B.V. All rights reserved.