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dc.contributor.authorRebholz, Clausen
dc.contributor.authorLeyland, A.en
dc.contributor.authorMatthews, A.en
dc.creatorRebholz, Clausen
dc.creatorLeyland, A.en
dc.creatorMatthews, A.en
dc.date.accessioned2019-05-06T12:24:24Z
dc.date.available2019-05-06T12:24:24Z
dc.date.issued1999
dc.identifier.urihttp://gnosis.library.ucy.ac.cy/handle/7/48751
dc.description.abstractTiAlBN coatings were synthesised by evaporating Ti and hot isostatically pressed TiAl0.68B3.67N2.44 material from a twin crucible source in an Ar plasma at 450°C. A combination of optical emission spectroscopy and partial pressure control was utilised to control the Ti and TiAl0.68B3.67N2.44 evaporation rates and hence the Ti-Al-B-N composition in the coating. The goal of this investigation was to study the influence of composition on the structural and mechanical properties of these coatings. The influence of the Ti/B ratio (in the range of 0.34-2.31) in TiAlBN coatings containing approximately 12 at.% Al and 40 at.% N (calculated from glow discharge optical emission spectroscopy data) is described. All coatings, consisting of two hard phases TiB2 and TiN, and a soft hexagonal BN phase, showed dense structures and a decrease in roughness values with increasing Ti/B ratios. The hardness and elastic modulus increased with increasing Ti/B ratios from 0.34 to 2.31 up to 37 GPa and 320 GPa, respectively. Coatings with Ti/B = 1.73-2.31 showed a twofold increase in wet cutting performance compared to commercially available TiN and TiAlN. However, due to the rather low amount of Al in the TiAlBN coatings no significant improvement in dry cutting compared to TiN was observed. © 1999 Published by Elsevier Science Ltd. All rights reserved.en
dc.language.isoengen
dc.sourceThin Solid Filmsen
dc.subjectMechanical propertiesen
dc.subjectSynthesis (chemical)en
dc.subjectTribologyen
dc.subjectVapor depositionen
dc.subjectElectron beamsen
dc.subjectTitanium compoundsen
dc.subjectElectron beam evaporationen
dc.subjectCeramic coatingsen
dc.subjectEvaporationen
dc.subjectPlasma applicationsen
dc.subjectComposition effectsen
dc.subjectBoridesen
dc.subjectHot isostatic pressingen
dc.subjectPartial pressureen
dc.subjectPhysical vapor deposition (PVD)en
dc.subjectPressure controlen
dc.subjectTitanium aluminum boron nitrideen
dc.subjectPhysical vapour depositionfr
dc.titleDeposition and characterisation of TiAlBN coatings produced by direct electron-beam evaporation of Ti and Ti-Al-B-N material from a twin crucible sourceen
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.1016/S0040-6090(98)01635-6
dc.description.volume343-344
dc.description.startingpage242
dc.description.endingpage245
dc.author.facultyΠολυτεχνική Σχολή / Faculty of Engineering
dc.author.departmentΤμήμα Μηχανικών Μηχανολογίας και Κατασκευαστικής / Department of Mechanical and Manufacturing Engineering
dc.type.uhtypeArticleen
dc.description.totalnumpages242-245


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