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Photomodulated thermoreflectance investigation of implanted wafers. Annealing kinetics of defects

dc.contributor.authorChristofides, Constantinosen
dc.contributor.editorChristofides, C. Ghibaudo,G.en
dc.creatorChristofides, Constantinosen
dc.date.accessioned2019-12-02T15:29:53Z
dc.date.available2019-12-02T15:29:53Z
dc.date.issued1997
dc.identifier.issn0080-8784
dc.identifier.urihttp://gnosis.library.ucy.ac.cy/handle/7/58583
dc.sourceSemiconductors and Semimetalsen
dc.subjectBEAM THERMOWAVE ANALYSISen
dc.subjectION-IMPLANTATIONen
dc.subjectOPTICAL REFLECTANCEen
dc.subjectPROCESSED SILICONen
dc.subjectROOM-TEMPERATUREen
dc.subjectSECONDARY DEFECTSen
dc.subjectSEMICONDUCTOR WAFERSen
dc.subjectSILICON-WAFERSen
dc.subjectTEMPERATURE-DEPENDENCEen
dc.subjectTHERMAL WAVE TECHNOLOGYen
dc.titlePhotomodulated thermoreflectance investigation of implanted wafers. Annealing kinetics of defectsen
dc.typeinfo:eu-repo/semantics/article
dc.description.volume46
dc.description.startingpage115
dc.description.endingpage150
dc.author.facultyΣχολή Θετικών και Εφαρμοσμένων Επιστημών / Faculty of Pure and Applied Sciences
dc.author.departmentΤμήμα Φυσικής / Department of Physics
dc.type.uhtypeArticleen
dc.description.notes<p>PT: Sen
dc.description.notesTC: 2en
dc.description.notesJ9: SEMICONDUCT SEMIMET</p>en
dc.source.abbreviationSemicond.Sdemimet.en
dc.contributor.orcidChristofides, Constantinos [0000-0002-4020-4660]
dc.gnosis.orcid0000-0002-4020-4660


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