Photothermal measurements on amorphous thin films deposited on crystalline silicon
Ημερομηνία
1996ISSN
0003-6951Source
Applied Physics LettersVolume
68Issue
4Pages
538-540Google Scholar check
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Metadata
Εμφάνιση πλήρους εγγραφήςΕπιτομή
Nondestructive photothermal reflectance and radiometric measurements have been performed on amorphous silicon thin films of various thicknesses deposited on crystalline silicon substrate, The influence of the film thickness on the photothermal reflectance and radiometric signals (amplitude and phase) is shown. (C) 1996 American Institute of Physics.