Growth and transport properties of HT-Li xCoO 2 thin films deposited by pulsed laser deposition
dc.contributor.author | Svoukis, E. | en |
dc.contributor.author | Athanasopoulos, G. I. | en |
dc.contributor.author | Moradpour, A. | en |
dc.contributor.author | Schneegans, O. | en |
dc.contributor.author | Revcolevschi, A. | en |
dc.contributor.author | Giapintzakis, John | en |
dc.creator | Svoukis, E. | en |
dc.creator | Athanasopoulos, G. I. | en |
dc.creator | Moradpour, A. | en |
dc.creator | Schneegans, O. | en |
dc.creator | Revcolevschi, A. | en |
dc.creator | Giapintzakis, John | en |
dc.date.accessioned | 2019-05-06T12:24:43Z | |
dc.date.available | 2019-05-06T12:24:43Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | http://gnosis.library.ucy.ac.cy/handle/7/48886 | |
dc.description.abstract | The successful in situ growth of single phase, c-axis oriented, layered structured Li xCoO 2 thin films on (0 0 0 1) Al 2O 3 substrates by pulsed laser deposition is reported. Thin films were grown in an oxygen pressure of 1 mbar and substrate temperatures varying from 300 up to 600°C. It is found that the surface roughness and electrical resistance of the films depends strongly on the deposition temperatures. © 2012 Elsevier B.V. | en |
dc.language.iso | eng | en |
dc.source | Applied Surface Science | en |
dc.subject | Pulsed laser deposition | en |
dc.subject | Thin films | en |
dc.subject | Cobalt compounds | en |
dc.subject | Substrates | en |
dc.subject | Vapor deposition | en |
dc.subject | Transport properties | en |
dc.subject | Deposition temperatures | en |
dc.subject | Single phase | en |
dc.subject | Substrate temperature | en |
dc.subject | Oxygen pressure | en |
dc.subject | CP-AFM | en |
dc.subject | Electrical resistances | en |
dc.subject | In-situ growth | en |
dc.subject | Layered structured | en |
dc.subject | LiCoO <sub>2</sub> | en |
dc.subject | LiCoO 2 | en |
dc.subject | Surface roughness | en |
dc.title | Growth and transport properties of HT-Li xCoO 2 thin films deposited by pulsed laser deposition | en |
dc.type | info:eu-repo/semantics/article | |
dc.identifier.doi | 10.1016/j.apsusc.2012.02.086 | |
dc.description.volume | 258 | |
dc.description.startingpage | 9366 | |
dc.description.endingpage | 9369 | |
dc.author.faculty | Πολυτεχνική Σχολή / Faculty of Engineering | |
dc.author.department | Τμήμα Μηχανικών Μηχανολογίας και Κατασκευαστικής / Department of Mechanical and Manufacturing Engineering | |
dc.type.uhtype | Article | en |
dc.contributor.orcid | Giapintzakis, John [0000-0002-7277-2662] | |
dc.description.totalnumpages | 9366-9369 | |
dc.gnosis.orcid | 0000-0002-7277-2662 |
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