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dc.contributor.authorChristofides, Constantinosen
dc.creatorChristofides, Constantinosen
dc.date.accessioned2019-12-02T15:29:54Z
dc.date.available2019-12-02T15:29:54Z
dc.date.issued1992
dc.identifier.issn0268-1242
dc.identifier.urihttp://gnosis.library.ucy.ac.cy/handle/7/58585
dc.description.abstractThis article reviews some recent results concerning the effects of isochronal annealing and the attempts to model the kinetics of local reconstruction mechanisms of layers with different degrees of inhomogeneity such as implanted unannealed and annealed silicon layers. The kinetics of the reconstruction mechanisms of the damaged layers and the annihilation of defects are studied via some electronic, optical and thermal-wave techniques. In order to determine the activation energy of the local annealing recovery mechanism the 'Law of Mass Action' (LMA) has been used. This showed that the kinetics of annihilation of the damage layer are consistent with a local annealing process in which the observed variation of the electric, optical and thermal parameters could be described by a relaxation-type relationship, The activation energy of the recovery process of the ion implantation damage is found to be between 0.1 and 0.8 eV. On the other hand, the range of annealing temperature from 400 to 600-degrees-C is the critical range where the layer reconstruction takes place.en
dc.sourceSemiconductor Science and Technologyen
dc.subjectPROCESSED SILICONen
dc.subjectROOM-TEMPERATUREen
dc.subjectSECONDARY DEFECTSen
dc.subjectTHERMAL WAVE TECHNOLOGYen
dc.subjectDAMAGEen
dc.subjectLUMINESCENCEen
dc.subjectOPTICAL-ABSORPTIONen
dc.subjectSEMICONDUCTORSen
dc.subjectTRANSPORTen
dc.subjectWAFERSen
dc.titleAnnealing Kinetics of Defects of Ion-Implanted and Furnace-Annealed Silicon Layers - Thermodynamic Approachen
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.1088/0268-1242/7/11/001
dc.description.volume7
dc.description.issue11
dc.description.startingpage1283
dc.description.endingpage1294
dc.author.facultyΣχολή Θετικών και Εφαρμοσμένων Επιστημών / Faculty of Pure and Applied Sciences
dc.author.departmentΤμήμα Φυσικής / Department of Physics
dc.type.uhtypeArticleen
dc.description.notes<p>PT: Jen
dc.description.notesTC: 22en
dc.description.notesJ9: SEMICOND SCI TECH</p>en
dc.source.abbreviationSemicond.Sci.Technol.en
dc.contributor.orcidChristofides, Constantinos [0000-0002-4020-4660]
dc.gnosis.orcid0000-0002-4020-4660


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