| dc.contributor.author | Seas, Antonios | en |
| dc.contributor.author | Christofides, Constantinos | en |
| dc.creator | Seas, Antonios | en |
| dc.creator | Christofides, Constantinos | en |
| dc.date.accessioned | 2019-12-02T15:32:36Z | |
| dc.date.available | 2019-12-02T15:32:36Z | |
| dc.date.issued | 1995 | |
| dc.identifier.issn | 0003-6951 | |
| dc.identifier.uri | http://gnosis.library.ucy.ac.cy/handle/7/59038 | |
| dc.source | Applied Physics Letters | en |
| dc.subject | TEMPERATURE | en |
| dc.subject | ION-IMPLANTATION | en |
| dc.subject | OPTICAL REFLECTANCE | en |
| dc.subject | PROCESSED SILICON | en |
| dc.subject | DAMAGE | en |
| dc.subject | SEMICONDUCTORS | en |
| dc.subject | WAFERS | en |
| dc.subject | DEFECTS | en |
| dc.subject | LAYERS | en |
| dc.title | Photothermal Reflectance Investigation of Implanted Silicon - the Influence of Thermal Annealing | en |
| dc.type | info:eu-repo/semantics/article | |
| dc.identifier.doi | 10.1063/1.113752 | |
| dc.description.volume | 66 | |
| dc.description.issue | 24 | |
| dc.description.startingpage | 3346 | |
| dc.description.endingpage | 3348 | |
| dc.author.faculty | Σχολή Θετικών και Εφαρμοσμένων Επιστημών / Faculty of Pure and Applied Sciences | |
| dc.author.department | Τμήμα Φυσικής / Department of Physics | |
| dc.type.uhtype | Article | en |
| dc.description.notes | <p>PT: J | en |
| dc.description.notes | TC: 17 | en |
| dc.description.notes | J9: APPL PHYS LETT</p> | en |
| dc.source.abbreviation | Appl.Phys.Lett. | en |
| dc.contributor.orcid | Christofides, Constantinos [0000-0002-4020-4660] | |
| dc.gnosis.orcid | 0000-0002-4020-4660 | |
